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radom was founded...

with the promise to serve the scientific community with advances in plasma technology. Centered around creating a robust plasma to be used by analytical chemists in spectroscopic instruments.  In 2014, this technology was funded by the NSF and WEDC. The Research work conducted at Dr. Gary Hieftje's lab, at Indiana University in Bloomington Indiana, used in combination with an Optical emissions spectrometer to perform analytical work towards the detection of metals may be found in journal publication.

JAAS citation: J. Anal. At. Spectrom, 2016, 31, 440 -449,
Talanta Citation: Talanta, 180, (2018), 25-31 

ABSTRACT

A novel inductively coupled plasma (ICP), termed the microwave-sustained, inductively coupled, atmospheric-pressure plasma (MICAP), has been developed that operates at microwave frequency (2.45 GHz). To sustain the new plasma, a dielectric resonator ring (fabricated from an advanced technical ceramic) is coupled with a 2.45 GHz microwave field generated from a microwave-oven magnetron. The microwave field induces polarization currents (small shifts in the equilibrium positions of bound electrons) in the resonator that generate an orthogonal magnetic field, analogous to that produced by electrical current within a traditional ICP load coil. This magnetic field is capable of sustaining an annular plasma in either air or nitrogen that can readily accept solution samples in the form of a wet aerosol produced from a conventional nebulizer and a spray chamber. An initial analytical evaluation of the MICAP with radially viewed optical emission spectrometry (OES) revealed that limits of detection ranged from 0.03–70 ppb with relative standard deviations from 0.7–2.0%. In addition, the new plasma exhibited good tolerance to solvent loading, and was found to be capable of accepting a wide variety of organic solvents directly and salt solutions up to 3% w/v concentration. Combined, the results suggest that the MICAP could be a competitive, simpler alternative to traditional, radiofrequency argon ICP-OES. 1